Ytterbium

W. O’Neill, K. Li, Q. Hu, P. Chopra, J. Kanghee, A. Buntardjo
Institute for Manufacturing, University of Cambridge, Cambridge, CB2 1RX, UK

Abstract

The advances in design, performance, cost reduction, and brightness for the modern Yb fiber laser have opened up the possibility of redefining the micro processing options for a range of semiconductor materials and micro fabrication production techniques at a wavelength of 1064nm. The usual laser of choice for micro electronics processing is the 532, 355, or 266 nm DPSS system. The provision of a new MOPA high brightness Yb based fiber laser configuration has provided a range of pulse parameters (10-200 ns FWHM), peak powers approaching ~ 2G Wcm^(-2) , and pulse repetition rates up to 500 kHz. These processing parameters offer a broad range of material response characteristics. This paper provides a preliminary analysis of the use of a Yb based fiber laser in the production of Si and Glassy Carbon microstructures and explores the potential of this source for low cost micromachining solutions.