Nanoimprint lithography (NIL)

Low-power humidity sensor for RFID applications

L. Löfgren (a), B. Löfving (a), T. Pettersson (a), B. Ottosson (a), C. Rusu (a), S. Haasl (a), K. Persson (a), O. Vermesan (b), N. Pesonen (c), P. Enoksson (d)

(a) The Imego Institute, Arvid Hedvalls Backe 4, SE-400 14 Göteborg, Sweden
(b) SINTEF ICT, N-0314 Oslo, Norway
(c) VTT, Wireless sensors, FIN-02044, Espoo, Finland
(d) Chalmers University of Technology, Micro and Nanosystems group, SE-41296 Göteborg, Sweden

Abstract

Wireless sensors incorporated in RFID systems are important in several industrial, consumer and logistics applications. By extending RFID tags to sensing applications, the products become smarter. Application areas for these smart tags include; health care (verification of the environmental conditions during transport or in storage of e.g. diapers, bandages, etc.), food monitoring (food quality during transport, storage and sales) and construction industry (e.g. building material).
In this paper, a small, very low power and low cost humidity sensor tailor made for passive RFID applications is presented. The sensor consists of a glass chip substrate with a sub-micron interdigitated gold electrode structure covered with a humidity sensitive polyimide layer. The humidity absorbed by the sensing layer is measured capacitively. Finite element modeling and analytic calculations were used to determine the design of the interdigitated electrodes and the optimal thickness of the polyimide layer. A read-out electronics circuit was designed and used to evaluate the sensor. Sensors were fabricated and calibrations have been made to verify their function. The sensor response was close to linear from below 20 to above 90 %RH and its response time was proven to be at least as short as that of the climate chamber, namely 0.1 %RH/s. The concept can easily be adapted to measure a range of other parameters such as temperature or the presence of certain substances.

Submitted on August 6, 2008 - 15:42.

Template fabrication incorporating different length scale features

G. Lalev (1), P. Petkov (1), N. Sykes (2), V. Velkova (1), S. Dimov (1), D. Barrow (2)

(1) Manufacturing Engineering Centre, Cardiff University, Newport Road,Cardiff, CF24 3AA, UK
(2) metaFAB, Cardiff University, Newport Road, Cardiff, CF24 3AA, UK

Abstract

A cost effective methodology for pattering of Nano Imprint Lithography (NIL) templates with different length scale features is proposed. The approach relies on selecting the optimum processing window of different technologies for cost effective micro and nano patterning. Very promising results were obtained when first fused silica templates were structured by F2 laser ablation at 157 nm without inducing phase transformation of the material. It was demonstrated that nanoscale features and complex 3D microscale features could be machined with a Focused Ion Beam (FIB) over the existing topography produced by laser ablation. Thus, a large area (up to several square centimetres) of the NIL templates is easily patterned with micro- and even meso-scale features by laser ablation while nano- and micro-scale features could be introduced by FIB machining.

Submitted on August 4, 2008 - 14:32.

A new tool for aligned micro-embossing and nano-imprinting

T.Rogers & I.Malmros
Applied Microengineering Limited, Unit 8 Library Avenue, Didcot, Oxon.,OX11 0SG, UK

Abstract

A new multi-purpose MEMS fabrication tool is described. The tool enables in-situ aligned embossing and nanoimprinting, in addition to surface activation and aligned wafer bonding. De-embossing is also included in-situ via the use of vacuum chucks and chamber pressurisation. The multi-purpose tool enables the fabrication of bonded, embossed, multi-layer, micro-fluidic devices, for example PDMS structures on silicon, including the alignment of the embossed structure to any pre-existing patterning on the silicon. Examples are presented of various structures that have been made using the tool along with a description of the principles of operation.

Submitted on July 29, 2008 - 13:46.
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