]> http://www.4m-net.org/taxonomy/term/1029/0 en http://www.4m-net.org/KnowledgeBase/papers/2008/06-14 <p>G. Lalev (1), P. Petkov (1), N. Sykes (2), V. Velkova (1), S. Dimov (1), D. Barrow (2)</p> <p>(1) Manufacturing Engineering Centre, Cardiff University, Newport Road,Cardiff, CF24 3AA, UK<br /> (2) metaFAB, Cardiff University, Newport Road, Cardiff, CF24 3AA, UK</p> <h3 >Abstract</h3> <p>A cost effective methodology for pattering of Nano Imprint Lithography (NIL) templates with different length scale features is proposed. The approach relies on selecting the optimum processing window of different technologies for cost effective micro and nano patterning. Very promising results were obtained when first fused silica templates were structured by F2 laser ablation at 157 nm without inducing phase transformation of the material. It was demonstrated that nanoscale features and complex 3D microscale features could be machined with a Focused Ion Beam (FIB) over the existing topography produced by laser ablation. Thus, a large area (up to several square centimetres) of the NIL templates is easily patterned with micro- and even meso-scale features by laser ablation while nano- and micro-scale features could be introduced by FIB machining.</p> 3D machining Focus ion beam (FIB) Focussed Ion Beam (FIB) Laser ablation laser ablation micromachining milling Nano Imprint Nanoimprint lithography (NIL) nanostructuring Mon, 04 Aug 2008 14:32:24 +0000