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3D micro and nanostructuring of an epoxy based resist by electron beam lithography

G. Rius, J. Bausells, C. Martín, A. Llobera and F. Pérez-Murano
Institut de Microelectrònica de Barcelona, IMB-CNM-CSIC, Barcelona, SPAIN

Abstract

We present the results of producing three dimensional micro- and nanostructures on an epoxy based resist. Epoxy based resists are very interesting in microsystems technology for their good mechanical properties, that allow to produce high aspect ratio microstructures. We have optimized the definition of free standing structures by either using electron beam lithography alone or combining electron beam lithography and UV optical lithography. To tune the energy and dose of the electron beam exposure properly, Monte Carlo simulations are used.

Submitted on July 30, 2008 - 13:53.

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